model G6-E
Combustion-type exhaust abatement system capable of simultaneous abatement of large volumes of hydrogen and chlorine gas
Features and Benefits
- Model G6-E is a combustion-type exhaust abatement system suited to the treatment of large volumes of gases containing hydrogen and chlorine used for epitaxial growth and other systems in processes to manufacture semiconductors. With a compact design, it is able to treat hydrogen at up to 200 L/min. Capable of treating chlorine gas and hydrogen gas simultaneously. Byproduct removal function installed as standard, reducing maintenance costs and load.
Specifications
| Type | Type | Unit | G6-E A1~A4 | G6-E P1~P4 |
| Abatement method | Abatement method | burn+ wet | burn+ wet式 | |
| Max. inflow gas volume | Max. inflow gas volume | L/min | 400 | 400 |
| Fuel | Fuel | City gas | Propane gas | |
| Dimensions | Dimensions | W x D x H mm | 1,200×650×1,900mm | 1,200×650×1,900mm |
| H2 abatement | H2 abatement | L/min | 200 | 200 |
| Gases (e.g.) | Gases (e.g.) | Process (depo) gases H2, PH3, Si3H8, SiH4, PH3, GeH4, AsH3, NH3, SiH2Cl2, B2H6, etc. Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. |
Process (depo) gases H2, PH3, Si3H8, SiH4, PH3, GeH4, AsH3, NH3, SiH2Cl2, B2H6, etc. Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. |
|
| Standard equipment | Standard equipment | Large flow-rate H2 abatement burner Burner scraper for powder removal |
Large flow-rate H2 abatement burner Burner scraper for powder removal |
|
| Options | Options | City water/drainage consumption reduction unit Fan scrubber for reduction of powder emissions |
City water/drainage consumption reduction unit Fan scrubber for reduction of powder emissions |
