model G5
Combustion-type exhaust abatement system that offers highly efficient treatment of flammable gases and perfluorocarbons (PFCs)
Features and Benefits
- The Model G5 range is a combustion-type exhaust abatement system that offers highly efficient abatement of many different gases used in manufacturing operations. Capable of batch treatment of multiple types of gases and of highly efficient treatment of PFCs, which are usually difficult to abate. With unique measures to remove byproducts and on-demand operation with variable fuel volume to suit the type and volume of gas being abated, Model G5 achieves reductions in running costs. Ideal for applications in the manufacturing operations of electric components such as semiconductors, LCD panels, solar cells, and LEDs, chemicals and materials manufacture, and research laboratories. Range includes large capacity models with flow rates of 1,200 L/min.
Specifications
| Type | Type | Unit | G5-350 A1~A4/P1~P4 | G5-500 A1~A4/P1~P4 | G5-600 A1~A4/P1~P4 | G5-1200 A1~A4/P1~P4 |
| Abatement method | Abatement method | burn+ wet | burn+ wet | burn+ wet | burn+ wet | |
| Max. inflow gas volume | Max. inflow gas volume | L/min | 350 | 500 | 600 | 1200 |
| Fuel | Fuel | City gas or propane gas | City gas or propane gas | City gas or propane gas | City gas or propane gas | |
| Dimensions | Dimensions | W x D x H mm | 1,200 x 650 x 1,900 | 1,200 x 650 x 1,900 | 1,200 x 1,100 x 2,000 | 1,200 x 1,100 x 2,200 |
| Gases (e.g.) | Gases (e.g.) | Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases Cleaning gases, including SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
Process (depo) gases SiH4, PH3, GeH4, NH3, SiH2Cl2, TEOS, B2H6, H2 Cleaning gases - all types NF3, ClF3, HF, F2, HCl, COF2, etc. Etching gases – all types HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc. PFCs CF4, C2F6, C3F8, CHF3, SF6, etc. |
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| Standard equipment | Standard equipment | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | Burner scraper for powder removal | |
| Options | Options | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit | City water/drainage consumption reduction unit |
