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EBARA Launches New Dry Vacuum Pump and Plasma Abatement System


EBARA Corporation (hereinafter: EBARA) will begin mass production and sequential release of new models of its Dry Vacuum Pump*1 Model EV-H and Plasma abatement system Model ELF*1 starting in 2026. Both products are being exhibited at SEMICON Japan 2025, which opens today at Tokyo Big Sight.

1. Overview of the Dry Vacuum Pump Model EV-H

As semiconductor manufacturing technology evolves, accompanied by the three-dimensionalization and miniaturization of devices, dry vacuum pumps attached to deposition equipment (such as ALD and CVD) are required to have process coverage that can handle high gas flow rates and ensure stable operation for uniform film deposition on complex shapes.

The newly announced Model EV-H maintains the compact and energy-saving performance of its conventional models while achieving greater capability for high-flow-rate gas handling. It also significantly improves durability against by-products compared to conventional models, adding a new function that prevents by-product deposition.

Furthermore, EBARA plans to incorporate DX (Digital Transformation) functions such as a failure prediction system, which has been under development, and a system to visualize utility consumption by collecting various pump data.

2. Overview of the Plasma Abatement System Model ELF

Various specialty material gases are used in semiconductor manufacturing processes. Conventionally, the detoxification of process gases was generally achieved using a decomposition method that relies on the combustion energy of fossil fuels. However, with the increasing need for measures to curb the emission of greenhouse gases like CO2, alternative treatment technologies that do not depend on fossil fuels are required. Model ELF addresses this by adopting a high-performance plasma reactor. Because it uses no fossil fuels, it significantly reduces CO2 emissions and is capable of efficiently decomposing greenhouse gases such as PFCs*2 (CF4, NF3) using only electricity. Additionally, its proprietary plasma reactor structure suppresses the emission of NOx (a cause of air pollution and global warming), achieving a treatment process with a lower environmental impact.

3. Future Developments

EBARA will continue to challenge issues with technology that meets customer expectations, contributing to the further development of the diversifying semiconductor industry and realizing the goal outlined in its long-term vision, "E-Vision 2030": "Elevate standards of living and support abundant lifestyles for all".

- About the EBARA Group -

The EBARA Group aims to contribute to the achievement of the Sustainable Development Goals (SDGs) by addressing material issues identified in its long-term vision and executing the medium-term management plan to increase corporate value.


*1 The “Model ○○○ ” displayed in the text is our model symbol.
*2 PFCs stands for PerFluoroCarbons. They are a type of fluorine-containing greenhouse gas (F-gas) that causes global warming and are among the gases targeted for reduction under the Kyoto Protocol.