8th EOI Symposium on Future Devices and CMP Challenges (More Moore, More than Moore)

Ebara Corporation (hereinafter referred to as Ebara) held the 8th EBARA Open Innovation Symposium online on June 6th. This time, the theme was "Future Devices and CMP Challenges (More Moore, More than Moore)."

EBARA's EOL (EBARA Open Laboratory)*1 is carrying out activities at the EHU (EBARA Hi-tech University)*2, which develops human resources to support technological advances. The EOI (EBARA Open Innovation)*3 symposium has been held as one of its activities since 2018, positioning it as a "forum for industry-academia collaboration that connects academia and business across technical fields."

Semiconductor devices, the theme of this symposium, have progressed in miniaturization in accordance with Moore's Law, and their performance has improved significantly. In the More Moore era, new materials are being introduced and new transistor structures are being developed to achieve further miniaturization. In addition, in the More than Moore era, diversification through heterogeneous integration*4 is driving development of new stacking technologies and new application fields. It is necessary to recognize the challenges facing CMP, which is responsible for the manufacturing of ever-evolving semiconductor devices, and to find ways to resolve them.

The speakers at this symposium were Professor Hitoshi Wakabayashi (Tokyo Institute of Technology), Associate Professor Fumihiro Inoue (Yokohama National University), Professor Emeritus Toshiro Doi (Kyushu University and Saitama University), and Dr. JiChul Yang, Vice President, Technology Research & Global Marketing of Ebara Technologies Incorporated, an Ebara group company. Approximately 140 employees of our company also participated.

This time, lectures were given on new structures, new materials, new manufacturing processes, new applications, etc. of semiconductor devices that are being developed to further improve performance in the two directions of More Moore (promoting miniaturization) and More than Moore (integrating various functions). A panel discussion was also held to discuss new challenges facing CMP and how to solve them.

In our long-term vision, "E-Vision 2030," we have set "contributing to the creation of an ever-prosperous life" as an important issue. EHU will continue to invite researchers from Japan and abroad to give lectures and hold seminars, etc., in order to strengthen product competitiveness, improve technological capabilities, and create new businesses.

EBARA Group aims to achieve the Sustainable Development Goals (SDGs) and further enhance its corporate value by addressing key ESG issues based on its long-term vision and medium-term management plan.

※1. EOL (EBARA Open Laboratory):

A corporate research organization where personnel exchanges among researchers and themes are open within the company

※2. EHU (EBARA Hi-tech University):

An initiative to promote the improvement of the skills of researchers and engineers and the creation of new research ideas by learning cutting-edge knowledge and technology

※3. EOI (EBARA Open Innovation):

A unique form of open innovation in which young researchers are trained within external research institutions while conducting joint research to solve advanced technological problems

※4. Heterogeneous Integration:

The integration of various chips with different technologies, functions, and sizes into a single package

【Event history】

・The 7th EOI Symposium "Considering the business value of sound - the cutting edge of acoustic technology and business applications"

・The 6th EOI Symposium "The 6th EBARA Open Innovation Symposium on CMP -Approaches to Smart CMP-"

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・The 3rd EOI Symposium "The 3rd EBARA Open Innovation Symposium on Cavitation"

・The 2nd EOI International Symposium "The 2nd EBARA Open Innovation International Symposium on CMP"

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