Ebara Corporation (hereinafter referred to as "Ebara") held an online symposium on the intelligence of CMP on June 16 by inviting prominent teachers in Japan and overseas entitled "The 6th Ebara Open Innovation Symposium on CMP -Approaches to Smart CMP-".
The sixth EOI symposium on CMP's approach to intelligence was held.

1. Background
EBARA is developing the activities of the EHU*1, which fosters human resources who support technological development. As one of its activities, the EOI*2 symposium is positioned as a "forum for the joint creation of industry-academia collaboration that connects academia and business across technology fields." Since 2018, it has been held.
Recent advances in AI and IoT technology have made it possible to control semiconductor manufacturing equipment and optimize processes in real time. Learning and self-inspection functions by Edge AI*3 are also progressing, and the intelligence of semiconductor manufacturing equipment is becoming an indispensable and source of competitiveness.
This symposium aimed to accelerate the enhancement of the competitiveness of CMP by sharing the status of in-house efforts on simulation, cyber physical systems, AI and xR, and discussing the possibilities and issues of intelligence development.
2-1 Overview
This symposium was attended by five teachers and more than 150 employees, including Professor Jing-Ming Guo (National Taiwan University of Technology), Professor Haedo Jeong (Busan University), Professor Akira Fukuda (Tokuyama University), Assistant Professor Yohei Hashimoto (Kanazawa University), and Professor Wa Suzuki (Chuo University). In the three sessions, teachers and EBARA researchers gave lectures on the use of AI and xR in CMP and simulation. In a subsequent round-table discussion, there was a lively discussion on the approach to intelligence in CMP:
3. Future developments
*1. EHU(Ebara Hi-tech University)
Initiatives to improve researchers and engineers' skills and promote the creation of new research ideas by learning cutting-edge knowledge and technology
*2. EOI(Ebara Open Innovation)
Joint research on solving advanced technology issues while nurturing young researchers within external research institutes, unique open innovation form
*3. Edge AI
The technique of carrying AI near the terminal and making it learn and infer
【Event History】
・The 5th EOI Symposium "The 5th Ebara Open Innovation Symposium on Computational Science & Optimization for Advanced Products & Processes"
・The 4th EBARA Open Innovation Symposium on Post CMP Cleaning Technology
・The 3rd EBARA Open Innovation Symposium on Cavitation
・The 2nd EOI International Symposium "The 2nd Ebara Open Innovation International Symposium on CMP"
・The 1st Ebara Open Innovation International Symposium on CMP