Ebara Corporation (hereafter: Ebara) was the first supplier of CMP equipment*1 to receive the “2020 Nanya Outstanding FE Tool Supplier Award” from Nanya Technology Co., Ltd. (Headquarters: Taiwan, Nanya Technology Corporation, hereafter: Nanya) on 7/6.
Received the 2020 Nanya Outstanding FE Tool Supplier Award for the first time from Nanya Technology Co., Ltd.
1. Background
The
“2020 Nanya Outstanding FE Tool Supplier Award” received by Ebara is awarded to supplier companies that excel in the selection criteria consisting of 8 items that Nanya places importance on. This time, it was evaluated for playing an important role in leading the industry, especially in terms of equipment effectiveness and cost.
2. Our future development
With the development of an
advanced information society, the semiconductor industry is evolving with an increasingly rapid sense of speed. People's lifestyles are changing more than ever before, and demand for technological innovation in semiconductors that support society is also growing. Encouraged by this award, Ebara will focus on “strengthening development capabilities to create overwhelming products” in the medium-term management plan “E-Plan 2022,” and will work to respond to various customer needs with an eye on markets such as AI and IoT in semiconductor device manufacturing equipment, and to contribute to further energy saving and environmental load reduction. The
Ebara Group aims to further improve corporate value and achieve the Sustainable Development Goals (SDGs) by addressing the medium-term management plan and ESG key issues based on management policies.
- *1:Chemical polishing equipment for flattening wafer surfaces at the nano level